NanoSeeX Inc.
Update：2025/12/03
Industries
Main Industry
Manufacturing
Main Product/Service
NanoSeeX Service Solutions
Tailored Packages to Fit Your Unique Needs
At NanoSeeX, providing exceptional customer support goes beyond merely responding to service requests quickly. We strive to exceed expectations by offering a comprehensive range of services, enabling our clients to customize support programs specifically tailored to their unique production requirements.
Our Offerings
Personalized On-Site Assistance
Our skilled engineers are available to provide immediate on-site support, ensuring your operations run smoothly with minimal disruptions.
Expert Technical Assistance
Our dedicated technical support team is available to address your needs, whether during regular hours or weekends.
Comprehensive Training Programs
We offer extensive training, both at your location and in-house, to ensure your team can fully leverage NanoSeeX’s cutting-edge technology.
Support Plans
Our flexible support plans are designed to either enhance your experience during the warranty period or extend coverage and benefits beyond it. These plans include scheduled preventative maintenance visits to ensure your equipment operates at peak performance.
Technical Support
Our programs ensure that your in-house maintenance personnel can access technical support whenever needed, ensuring continuous operation and efficiency.
Technological Edge
NanoSeeX's innovative technology sets us apart. We lead with our unique high-order EM-wave analysis method, which achieves unprecedented de-correlation of model-based parameters. Our solutions boast an impressive linearity of R^2=0.99, precision of 0.1 nm, and accuracy under 1 nm, meeting stringent production demands. Additionally, our patented fan-shaped focusing technology provides superior z-direction resolution and Signal-to-Noise Ratio (SNR), crucial for detailed 3D structural analysis. Our algorithms, developed in-house and rigorously tested on thousands of samples, are designed to handle blind tests and significant process variations. Our technology is the first to feature a 12-inch wafer demo machine, thoroughly tested and validated to ensure reliability and performance.
Industry Leadership
NanoSeeX's technology addresses critical production and yield-related checkpoints, outperforming competitors who struggle with these challenges. We provide solutions that enhance production efficiency and ensure superior product quality
Tailored Packages to Fit Your Unique Needs
At NanoSeeX, providing exceptional customer support goes beyond merely responding to service requests quickly. We strive to exceed expectations by offering a comprehensive range of services, enabling our clients to customize support programs specifically tailored to their unique production requirements.
Our Offerings
Personalized On-Site Assistance
Our skilled engineers are available to provide immediate on-site support, ensuring your operations run smoothly with minimal disruptions.
Expert Technical Assistance
Our dedicated technical support team is available to address your needs, whether during regular hours or weekends.
Comprehensive Training Programs
We offer extensive training, both at your location and in-house, to ensure your team can fully leverage NanoSeeX’s cutting-edge technology.
Support Plans
Our flexible support plans are designed to either enhance your experience during the warranty period or extend coverage and benefits beyond it. These plans include scheduled preventative maintenance visits to ensure your equipment operates at peak performance.
Technical Support
Our programs ensure that your in-house maintenance personnel can access technical support whenever needed, ensuring continuous operation and efficiency.
Technological Edge
NanoSeeX's innovative technology sets us apart. We lead with our unique high-order EM-wave analysis method, which achieves unprecedented de-correlation of model-based parameters. Our solutions boast an impressive linearity of R^2=0.99, precision of 0.1 nm, and accuracy under 1 nm, meeting stringent production demands. Additionally, our patented fan-shaped focusing technology provides superior z-direction resolution and Signal-to-Noise Ratio (SNR), crucial for detailed 3D structural analysis. Our algorithms, developed in-house and rigorously tested on thousands of samples, are designed to handle blind tests and significant process variations. Our technology is the first to feature a 12-inch wafer demo machine, thoroughly tested and validated to ensure reliability and performance.
Industry Leadership
NanoSeeX's technology addresses critical production and yield-related checkpoints, outperforming competitors who struggle with these challenges. We provide solutions that enhance production efficiency and ensure superior product quality
Founded Year
2023
Unified Business No.
94118256
Status
Active
Number of Employees
10
Total Paid-in
Capital
384,120,000 (NT$)
Location of Company
Taiwan
, Hsinchu County
Year of establishment, company status, responsible person, paid-in capital amount, and registered address are sourced from the "Commerce Industrial Services Portal, Department of Commerce, MOE. Exit status refers to various situations, including emerging stock exchanges (e.g., potential exits), mergers and acquisitions (M&A), and IPOs. The overseas development countries are collected through information provided by startups themselves and the information filled in when registering for matchmaking events. Therefore, the information cannot be updated in real time. If you wish to make corrections, please email findit.tier@gmail.com. Thank you.
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About the Company
Company Profile
Company Description
NanoSeeX develops the first in-line and non-destructive 3D critical dimension(CD) metrology system
Run by a team from ITRI which develops X-ray metrology tool for advanced node monitoring since 2016
Potential applications of the technology：
Advanced 3D Transistor
The team is developing a tool for offering high precision & accuracy measurements of the key 3D CD features such as etch back, inner spacer, STI smiling and multi-thickness processes.
EUV Mask & Pellicle
Interlayer & thickness yeild quality control, and successfully identified EUV reflectivity (EUVR) variations corresponding to a 2% yield difference across different products.
Photonics
Including 3D component structures for leading international AR and VR optical manufacturers
Company Description
NanoSeeX develops the first in-line and non-destructive 3D critical dimension(CD) metrology system
Run by a team from ITRI which develops X-ray metrology tool for advanced node monitoring since 2016
Potential applications of the technology：
Advanced 3D Transistor
The team is developing a tool for offering high precision & accuracy measurements of the key 3D CD features such as etch back, inner spacer, STI smiling and multi-thickness processes.
EUV Mask & Pellicle
Interlayer & thickness yeild quality control, and successfully identified EUV reflectivity (EUVR) variations corresponding to a 2% yield difference across different products.
Photonics
Including 3D component structures for leading international AR and VR optical manufacturers
